MASK, EXPOSURE METHOD AND METHOD OF MANUFACTURING DEVICE

摘要

PROBLEM TO BE SOLVED: To provide an exposure method which can expose patterns of contact hole arrays having fine hole diameters or the patterns intermingled with the isolated contact holes and the contact hole arrays with high resolution without exchanging a mask and an apparatus for the same.

SOLUTION: The mask having the patterns to be transferred to a substrate have the first desired contact hole patterns, the first dummy contact hole patterns which are arrayed on the peripheries of the first desired contact hole patterns and have the hole diameters smaller than the hole diameters of the first desired contact hole patterns, the second desired contact hole patterns which are different in the hole diameters from the first desired contact hole patterns and the second dummy contact hole patterns which are arrayed on the peripheries of the second desired contact hole patterns and have the hole diameters smaller than the hole diameters of the second desired contact hole patterns.

COPYRIGHT: (C)2003,JPO