| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a dry film resist excellent in suitability of a protective film to peeling from a photosensitive layer. <P>SOLUTION: The dry film resist is obtained by stacking, in order, a support film, a photosensitive layer having ≥50 dyn/cm surface tension and a protective film having ≤40 dyn/cm surface tension of a surface which contacts with the photosensitive layer. The protective film is a polyester film on which a release layer containing a silicone compound has been disposed and the peel strength between the photosensitive layer and the protective film is preferably adjusted to ≤50 gf/50 mm. <P>COPYRIGHT: (C)2003,JPO |
