发明名称 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
摘要 <p><P>PROBLEM TO BE SOLVED: To prevent the deviation of alignment between an inner lead and a projected electrode of a semiconductor chip resulting from the fluctuation of the manufacturing a film substrate. <P>SOLUTION: A distance A up to the other end from one end of a line of the output side inner lead 5a of a film substrate, a distance B up to one end of a line of the input side inner lead 5a from one end of a line of the output side inner lead 5a, a distance C up to the other end of a line of the input side inner lead 5a from one end of a line of the output side inner lead 5a, a distance between A and B up to one end of a line of the input side inner lead 5a from the other end of a line of the output side inner lead 5a, a distance between A and C up to the other end of a line of the input side inner lead 5a from the other end of a line of the output side inner lead 5a, and a distance between C and B up to one end from the other end of a line of the input side inner lead 5a are measured. When these sizes A, B, C, A-B, A-C and B-C are within the allowance of the alignment of the inner lead 5a and an Au bump, the film substrate is determined as a good product. <P>COPYRIGHT: (C)2003,JPO</p>
申请公布号 JP2003243446(A) 申请公布日期 2003.08.29
申请号 JP20020043882 申请日期 2002.02.20
申请人 HITACHI LTD;MCS:KK 发明人 TOJO SHINJI;KANEMITSU NOBUYA;KOYANAGI AKIRA
分类号 H01L21/60;(IPC1-7):H01L21/60 主分类号 H01L21/60
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