发明名称 Coated silicon carbide cermet used in a plasma reactor
摘要 A complexly shaped Si/SiC cermet part including a protective coating deposited on a surface of the cermet part facing the plasma of the reactor. The cermet part is formed by casting a SiC green form and machining the shape into the green form. The green form is incompletely sintered such that it is unconsolidated and shrinks by less than 1% during sintering. Molten silicon is flowed into the voids of the unconsolidated sintered body. Chemical vapor deposition or plasma spraying coats onto the cermet structure a protective film of silicon carbide, boron carbide, diamond, or related carbon-based materials. The part may be configured for use in a plasma reactor, such as a chamber body, showerhead, focus ring, or chamber liner.
申请公布号 US2003198749(A1) 申请公布日期 2003.10.23
申请号 US20020125135 申请日期 2002.04.17
申请人 APPLIED MATERIALS, INC. 发明人 KUMAR ANANDA H.;WU ROBERT W.;YIN GERALD ZHEYAO;BILEK GABRIEL
分类号 C04B41/45;C04B41/81;H01J37/32;(IPC1-7):C23F1/00;C23C16/00;H01L21/306;B05D3/02 主分类号 C04B41/45
代理机构 代理人
主权项
地址