发明名称 Liquid crystal display device and manufacturing method of liquid crystal display device
摘要 A horizontal electric field mode liquid crystal display device having a novel electrode structure, and a manufacturing method thereof are provided. The liquid crystal display device includes a first substrate having an insulating surface; a first conductive film and a second conductive film over the insulating surface; a first insulating film over the first conductive film; a second insulating film over the second conductive film; a second substrate facing the first substrate; and a liquid crystal layer positioned between the first substrate and the second substrate. Part of the first conductive film exists also on a side portion of the first insulating film, and part of the second conductive film exists also on a side portion of the second insulating film. The liquid crystal layer includes liquid crystal exhibiting a blue phase.
申请公布号 US9454048(B2) 申请公布日期 2016.09.27
申请号 US201213416077 申请日期 2012.03.09
申请人 SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 发明人 Miyairi Hidekazu;Ishitani Tetsuji;Kubota Daisuke;Sasagawa Shinya
分类号 G02F1/1343;C09K19/02;G02F1/1362 主分类号 G02F1/1343
代理机构 Nixon Peabody LLP 代理人 Nixon Peabody LLP ;Costellia Jeffrey L.
主权项 1. A manufacturing method of a liquid crystal display device, comprising the steps of: forming a first conductive layer over an insulating surface; forming a first insulating layer and a second insulating layer over the first conductive layer; and etching the first conductive layer with a first dry etching using the first insulating layer and the second insulating layer as masks, thereby a second conductive layer on a bottom surface and a side surface of the first insulating layer and a third conductive layer on a bottom surface and a side surface of the second insulating layer are formed, wherein, the second conductive layer remains on the bottom surface and the side surface of the first insulating layer in the liquid crystal display device, and wherein, the third conductive layer remains on the bottom surface and the side surface of the second insulating layer in the liquid crystal display device, wherein, in the etching step, at least one of a conductive material for forming the first conductive layer, and a reaction product of the conductive material and a gas used for the first dry etching, is deposited on the side surface of the first insulating layer and the side surface of the second insulating layer.
地址 Kanagawa-ken JP