SUBSTRATE TREATING DEVICE AND SUBSTRATE TREATING SYSTEM

摘要

PROBLEM TO BE SOLVED: To provide a substrate treating device capable of discovering a defective coating without a special inspector. SOLUTION: A discharge state of a photoresist agent from a treating agent supply nozzle to a substrate is monitored by a CCD camera, and if abnormalities in the discharge state are detected, the substrate is collected to a reject cassette (step U1) dedicated to collection of the defective substrate. If the predetermined quantity of defective substrates is accommodated in the reject cassette, the reject cassette is transported to a rework device (not shown) outside the substrate treating system (step U3). The transported defective substrates in the reject cassette are sequentially subjected to a recycling treatment with a resist separation agent (step U4). COPYRIGHT: (C)2004,JPO