发明名称 DEVELOPMENT APPARATUS, DEVELOPMENT METHOD AND PRODUCTION METHOD OF MULTILAYER CERAMIC SUBSTRATE
摘要 <P>PROBLEM TO BE SOLVED: To enable high-precision development by spraying fine droplets of developer at high pressure and to precisely form through-holes of a small diameter having a deep and ideal shape by spraying the fine droplets of developer at high pressure. <P>SOLUTION: The development apparatus comprises development regions B1, B2 provided with a tank 3 storing developer, nozzles 4a, 4b jetting droplets of developer and pumps 5a, 5b supplying the developer of the tank 3 to the nozzles 4a, 4b and rinsing regions C1, C2 provided with a tank C storing water which rinses the developer, nozzles 7a, 7b jetting rinse water and pumps 8a, 8b supplying the rinse water to the nozzles 7a, 7b. Therein, pressure of the nozzle 5a in the development region B1 is made to be &le;1 MPa, the average droplet size of the developer jetted from the nozzle 5a is made to be &ge;100 &mu;m, pressure of the nozzle 4b of the development region B2 is made to be >1 MPa and the average droplet size of the developer jetted from the nozzle 4b is made to be <100 &mu;m. <P>COPYRIGHT: (C)2004,JPO
申请公布号 JP2003345036(A) 申请公布日期 2003.12.03
申请号 JP20020156282 申请日期 2002.05.29
申请人 KYOCERA CORP 发明人 TATENO SHUICHI
分类号 G03F7/004;G03F7/30;G03F7/40 主分类号 G03F7/004
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