| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method for designing and a method for manufacturing preventing the hollow of erosion generated by the coarseness and minuteness in an area with different polishing speed to obtain a polished surface with good flatness, when forming STI structure and wiring structure using a CMP method. <P>SOLUTION: The methods equally divide a layout area into a small area to calculate an area ratio every small area thereof divided and then judge whether the area ratio is within a first prescribed range. Then, when the small area is out of the range, they arrange a dummy area or divide a pattern to make it within the range. After judgment on all small areas, they divide the layout area into a large area with different size from the small area to calculate the area ratio and judge whether the area ratio is within a second prescribed range. When the large area is out of the range, they make it within the range in the same way as the above. <P>COPYRIGHT: (C)2004,JPO</p> |
