| 摘要 |
PURPOSE: A method for fabricating a capacitor is provided to obtain a low leakage current even if the thickness of alumina is not greater than 50 angstrom by forming the alumina with an excellent characteristic in an interface between a lower electrode and alumina. CONSTITUTION: The lower electrode is formed. The surface of the lower electrode is hydrogen-terminated. An oxide layer is formed on the hydrogen-terminated lower electrode. The alumina is formed on the oxide layer. An upper electrode is formed on the alumina. The oxide layer is formed by a cleaning process using a SC1 cleaning solution, a rapid thermal annealing process and an ozone treatment process.
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