发明名称 SiC power device having a high voltage termination
摘要 In one general aspect, an apparatus can include a semiconductor region including a silicon carbide material and a junction termination extension implant region disposed in the semiconductor region. The apparatus can include a low interface state density portion of a dielectric layer having at least a portion in contact with the junction termination extension implant region.
申请公布号 US9461108(B2) 申请公布日期 2016.10.04
申请号 US201514750655 申请日期 2015.06.25
申请人 Fairchild Semiconductor Corporation 发明人 Konstantinov Andrei
分类号 H01L29/15;H01L29/06;H01L29/16;H01L29/10;H01L29/861;H01L29/78;H01L29/66;H01L29/872;H01L29/732 主分类号 H01L29/15
代理机构 Brake Hughes Bellermann LLP 代理人 Brake Hughes Bellermann LLP
主权项 1. An apparatus, comprising: a semiconductor region including a silicon carbide material; a junction termination extension (JTE) implant region disposed in the semiconductor region; and a low interface state density portion of a dielectric layer having at least a portion in contact with the JTE implant region.
地址 San Jose CA US