发明名称 |
SiC power device having a high voltage termination |
摘要 |
In one general aspect, an apparatus can include a semiconductor region including a silicon carbide material and a junction termination extension implant region disposed in the semiconductor region. The apparatus can include a low interface state density portion of a dielectric layer having at least a portion in contact with the junction termination extension implant region. |
申请公布号 |
US9461108(B2) |
申请公布日期 |
2016.10.04 |
申请号 |
US201514750655 |
申请日期 |
2015.06.25 |
申请人 |
Fairchild Semiconductor Corporation |
发明人 |
Konstantinov Andrei |
分类号 |
H01L29/15;H01L29/06;H01L29/16;H01L29/10;H01L29/861;H01L29/78;H01L29/66;H01L29/872;H01L29/732 |
主分类号 |
H01L29/15 |
代理机构 |
Brake Hughes Bellermann LLP |
代理人 |
Brake Hughes Bellermann LLP |
主权项 |
1. An apparatus, comprising:
a semiconductor region including a silicon carbide material; a junction termination extension (JTE) implant region disposed in the semiconductor region; and a low interface state density portion of a dielectric layer having at least a portion in contact with the JTE implant region. |
地址 |
San Jose CA US |