发明名称 ATMOSPHERIC PRESSURE PLASMA PROCESSING METHOD AND APPARATUS USING MICROWAVE
摘要 <P>PROBLEM TO BE SOLVED: To provide an atmospheric pressure processing method and an apparatus using microwaves, which are capable of enabling an electric discharge to occur stably and reducing a required amount of carrier gas, such as helium gas or the like remarkably. <P>SOLUTION: In the atmospheric pressure plasma processing method using microwaves, the internal pressure of a processing chamber is reduced to 10 to 700 Torr, microwaves are introduced into the processing chamber to produce a glow discharge, then the inside of the processing chamber is returned to an atmospheric pressure, and a substrate is subjected to plasma processing in the processing chamber. The atmospheric pressure plasma processing apparatus using microwaves is equipped with a scavenging pump means which is installed inside the processing chamber and capable of reducing the internal pressure of the processing chamber to 10 to 700 Torr when a glow discharge starts. At least, the internal wall of the processing chamber is partially formed of dielectrics, and the microwaves are introduced into the processing chamber from a microwave oscillator through a waveguide and the dielectric wall of the processing chamber. <P>COPYRIGHT: (C)2004,JPO
申请公布号 JP2004031509(A) 申请公布日期 2004.01.29
申请号 JP20020183272 申请日期 2002.06.24
申请人 ULVAC JAPAN LTD 发明人 TAKEI HIDEO;SAKIO SUSUMU;ISHIBASHI AKIRA;ISHIKAWA MICHIO
分类号 H05H1/46;C23C16/511;H01L21/3065;H01L21/31 主分类号 H05H1/46
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