| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a compound which excels as an acid-generating agent, a radiation-sensitive acid-generating agent containing the compound, and a radiation-sensitive resin composition containing the acid-generating agent. <P>SOLUTION: This compound is represented by formula (1), e.g. 1,2-bis(butylsulfonyloxyimino)-1,2-bis(methylthio)ethane, and the radiation-sensitive acid-generating agent contains the above compound having a sulfonyl structure. Further, the positive radiation-sensitive resin composition contains the above acid-generating agent and an acid dissociative group-containing resin, and the negative radiation-sensitive resin composition contains the acid-generating agent, an alkali soluble resin and a crossl-inking agent. <P>COPYRIGHT: (C)2004,JPO |
