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发明名称
热平板退火处理
摘要
一种具有一加工室之快速热加工器,其包含一以可加热物体形式之稳定热源。使用一系列之加热装置将热提供至该可加热物体,该可加热物体之温度建构出一放置在接触或紧邻该可加热物体之半导体晶圆的温度。为减少温度梯度,该可加热物体可包括在一由隔绝物质诸如不透明石英等构成之隔绝隔室,该隔绝隔室之上部可包括一进入部分,允许该半导体晶圆放置在安置在内部之可加热物体上。加工过程中,该晶圆可更进一步曝露在一高强度照射能源停留一短暂时间。
申请公布号
TW200406033
申请公布日期
2004.04.16
申请号
TW092120985
申请日期
2003.07.31
申请人
晶圆大师股份有限公司
发明人
于伍锡
分类号
H01L21/324
主分类号
H01L21/324
代理机构
代理人
恽轶群;陈文郎
主权项
地址
美国
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