RETICLE SET, METHOD FOR DESIGNING RETICLE SET, METHOD FOR MONITORING EXPOSURE, METHOD FOR INSPECTING RETICLE SET AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a reticle set for monitoring the exposure conditions in a double exposure process with high accuracy.

SOLUTION: The reticle set includes a first photomask 5 and a second photomask. The first photomask 5 has circuit patterns 10a to 10c having first and second openings 11a to 11c and 12a to 12c arranged adjacent to each other interposing linear first light shielding parts 13a to 13c, respectively, and monitor marks arranged near the circuit patterns 10a to 10c. The second photomask has trim patterns which have second light shielding parts to cover the first light shielding parts 13a to 13c in the region of the circuit patterns 10a to 10c when the second photomask is overlapped with the first photomask 5, and which have extended parts overlapping with the one end of the first light shielding parts 13a to 13c and extending to the outside of the region of the circuit patterns 10a to 10c.

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