发明名称 Processing station for planar substrates and method for processing planar substrates
摘要 A processing station for two-dimensional substrates including at least two processing units and at least two conveyor lines for substrates arranged in parallel to another, wherein both the processing units are placed between the two conveyor lines, and an arrangement for moving the substrates from the conveyor lines to the processing units and back is provided. The arrangement includes four linear conveyor units each having at least one substrate support, wherein a first linear conveyor unit leads from the second conveyor line to the first processing unit, a second linear conveyor unit leads from the first conveyor line to the first processing unit, a third linear conveyor unit leads from the first conveyor line to the second processing unit, and a fourth linear conveyor unit leads from the second conveyor line to the second processing unit.
申请公布号 US9484234(B2) 申请公布日期 2016.11.01
申请号 US201314384295 申请日期 2013.02.25
申请人 JRT PHOTOVOLTAICS GMBH & CO. KG 发明人 Reichenbach Michael;Bau Markus
分类号 B65G37/00;H01L21/677 主分类号 B65G37/00
代理机构 Flynn, Thiel, Boutell & Tanis, P.C. 代理人 Flynn, Thiel, Boutell & Tanis, P.C.
主权项 1. A processing station for substrates including at least two processing units and at least two conveyor lines for substrates arranged in parallel to one another, wherein both of the processing units are placed between the two conveyor lines, the processing station further including a moving arrangement for moving the substrates from the two conveyor lines to the processing units and back, the moving arrangement including four linear conveyor units each having at least one substrate support, wherein a first of the four linear conveyor units is disposed between a transfer point in a second of the two conveyor lines and a first of the two processing units, a second of the four linear conveyor units is disposed between a transfer point in a first of the two conveyor lines and the first processing unit, a third of the four linear conveyor units is disposed between the transfer point in the first conveyor line and a second of the two processing units, and a fourth of the four linear conveyor units is disposed between the transfer point in the second conveyor line and the second processing unit, the first and the fourth linear conveyor units being configured to move the respective substrate support to the transfer point in the second conveyor line and, the second and the third linear conveyor units being configured to move the respective substrate support to the transfer point in the first conveyor line.
地址 Malterdingen DE