发明名称 PHOTOSENSITIVE RESIN COMPOSITION FOR SPACER
摘要 <P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition for spacers, which adopts a flow coating method in the case of coating a large-sized substrate for a liquid crystal display, is so excellent in uniformity of coating within the substrate as not to leaving linear traces (including horizontal linear traces and vertical linear traces) and cloudy traces, and ensures a small film thickness variation in the periphery of the substrate. <P>SOLUTION: The photosensitive resin composition for spacers comprises (A) an alkali-soluble resin, (B) a polymerizable compound having an ethylenically unsaturated bond, (C) a photopolymerization initiator and (D) a solvent, and the photosensitive resin composition has a viscosity of 3.0-18.0 cps at 25&deg;C, a solid content of 10-35 wt.% and a contact angle of &le;21&deg; between the photosensitive resin composition and a large-sized substrate for a liquid crystal display. <P>COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004233975(A) 申请公布日期 2004.08.19
申请号 JP20030401772 申请日期 2003.12.01
申请人 QIMEI INDUSTRY CO LTD 发明人 LEE SHUNKEN;SEI BAIKA;RIN HAKUSEN;SHI SHUNAN;KYO HAKUGI
分类号 G03F7/004;C08F265/00;C09D4/00;C09D5/00;C09D163/00;G02F1/1339;G03F7/032;G03F7/033 主分类号 G03F7/004
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