| 发明名称 |
MASK FOR HYPERSENSITIVITY TO CHEMICAL SUBSTANCE |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a mask efficiently removing a chemical substance, particularly low-grade aldehydes, having excellent safety and adsorbing performance and improved in fitting property. <P>SOLUTION: This mask for hypersensitivity to the chemical substance has a layer containing a porous adsorbent, and has a formaldehyde removal rate of 50% or more. <P>COPYRIGHT: (C)2004,JPO&NCIPI |
| 申请公布号 |
JP2004230105(A) |
申请公布日期 |
2004.08.19 |
| 申请号 |
JP20030044572 |
申请日期 |
2003.02.21 |
| 申请人 |
KURARAY CO LTD;KURARAY CHEM CORP |
发明人 |
KONISHI TAKESHI;KAWASAKI SEIYA;YOSHIKAWA TAKAYUKI |
| 分类号 |
A62B18/02;A62B18/08;B01J20/22 |
主分类号 |
A62B18/02 |
| 代理机构 |
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