发明名称 Semiconductor device and nonvolatile semiconductor memory device comprising a plurality of semiconductor elements as well as process for the same
摘要 A semiconductor device of which the process is simplified so that the manufacturing cost can be reduced and, at the same time, which has a semiconductor element that can control a current of high voltage is provided. The semiconductor device includes first and second semiconductor elements and the first semiconductor element includes a lower electrode formed above a substrate, an intermediate insulating film formed on the lower electrode and an upper electrode formed on the insulating film. The second semiconductor element includes a gate insulating film, which is formed on the substrate and which includes the same layer as that of the intermediate insulating film, and a gate electrode formed on the gate insulating film.
申请公布号 US6784057(B2) 申请公布日期 2004.08.31
申请号 US20010920951 申请日期 2001.08.03
申请人 RENESAS TECHNOLOGY CORP. 发明人 NISHIOKA NAHO
分类号 H01L21/8247;H01L27/10;H01L27/105;H01L27/115;H01L29/788;H01L29/792;(IPC1-7):H01L21/336 主分类号 H01L21/8247
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