METHOD FOR TREATING RESIDUAL FINE PARTICLES PRODUCED FROM DIRECT METHYLCHLOROSILANE MANUFACTURING PROCESS TO EFFECTIVELY REMOVE COPPER AND RECOVER THE REMOVED COPPER

摘要

PURPOSE: A method for treating residual fine particles produced from a direct methylchlorosilane manufacturing process is provided, thereby effectively removing copper from the residual fine particles, treating the copper removed residual fine particles as general wastes, and recovering the removed copper as copper hydroxide. CONSTITUTION: The method for treating residual fine particles produced from a direct methylchlorosilane manufacturing process using metallic silicon and methane chloride comprises the steps of: (1) treating copper containing residual fine particles with an acid selected from hydrochloric acid, sulfuric acid and nitric acid and filtering the acid treated residual fine particles to separate solid fine particles and filtered solution; (2) washing the filtered solid fine particles with water or acid; and (3) adding caustic soda into a mixture of the filtered solution and the washed solid fine particles to regulate the pH value of the mixture to 7 to 11 and recovering copper hydroxide.