发明名称 Semiconductor memory device
摘要 A semiconductor memory device is provided which can achieve the high integration, ultra-high speed operation, and significant reduction of power consumption during the information holding time, by reducing the increase in the area of a memory cell and obtaining a period of the ultra-high speed readout time and ensuring a long refresh period at the time of the self refresh. A DRAM employing a one-intersection cell.two cells/bit method has a twin cell structure employing a one-intersection 6F<2 >cell, the structure in which: memory cells are arranged at positions corresponding to all of the intersections between a bit-line pair and a word line; and when a half pitch of the word line is defined as F, a pitch of each bit line of the bit-line pair is larger than 2F and smaller than 4F. Further, an active region in the silicon substrate, on which a source, channel and drain of the transistor of each memory cell are formed, is obliquely formed relative to the direction of the bit-line pair.
申请公布号 US6828612(B2) 申请公布日期 2004.12.07
申请号 US20030388639 申请日期 2003.03.17
申请人 HITACHI, LTD.;HITACHI ULSI SYSTEMS CO., LTD.;ELPIDA MEMORY, INC. 发明人 MIYATAKE SHINICHI;KAJIGAYA KAZUHIKO;MIYAZAWA KAZUYUKI;SEKIGUCHI TOMONORI;TAKEMURA RIICHIRO;SAKATA TAKESHI
分类号 G11C11/401;G11C7/18;G11C11/403;G11C11/405;G11C11/406;G11C11/4097;H01L21/8242;H01L27/02;H01L27/108;H01L29/76;H01L29/94;H01L31/0328;H01L31/119;(IPC1-7):H01L27/108 主分类号 G11C11/401
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