发明名称 PHOTO TRACK DEVICE CAPABLE OF SHIELDING WAFER FROM RADIATION OF HOT PLATE USING ELEVATOR AND HEAT BLOCKING PLATE AND CONTROLLING METHOD THEREOF
摘要 PURPOSE: A photo track device and a controlling method thereof are provided to improve the stability of processes by shielding a wafer from the radiation of a hot plate using an elevator and a heat blocking plate. CONSTITUTION: A photo track device includes a hot plate, an elevator, a support part and a heat blocking plate. The hot plate(8) generates heat to bake a wafer(14). The elevator(10a,10b) moves the wafer up and down. The support part(12a,12b) is installed at a lower portion of the elevator to support and fix the wafer. The heat blocking plate(16) is installed between the wafer and the hot plate.
申请公布号 KR20050002379(A) 申请公布日期 2005.01.07
申请号 KR20030043756 申请日期 2003.06.30
申请人 HYNIX SEMICONDUCTOR INC. 发明人 JEONG, JAE KWAN
分类号 H01L21/027;(IPC1-7):H01L21/027 主分类号 H01L21/027
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