发明名称 Solution treatment unit
摘要 The present invention relates to a solution treatment unit for supplying a treatment solution to a substrate to treat the substrate within a treatment container, and an inner container surrounding an outer periphery of the horizontally held substrate with its upper and lower faces open is provided in the treatment container. An exhaust pipe for exhausting an atmosphere in the treatment container is provided in a bottom portion of the treatment container and inside the inner container. An exhaust port of the exhaust pipe is open at a position higher than the bottom portion. A drain port for draining the treatment solution in the treatment container is provided in the bottom portion. According to the present invention, the drain of a solution and the exhaust of an atmosphere can be performed separately without being mixed, and hence pressure loss of a fan on the factory side which performs an exhaust operation can be reduced, resulting in a reduction in excess power consumption.
申请公布号 US6843259(B2) 申请公布日期 2005.01.18
申请号 US20020115240 申请日期 2002.04.04
申请人 TOKYO ELECTRON LIMITED 发明人 NAGAMINE SHUICHI
分类号 G03F7/30;B08B3/04;H01L21/00;H01L21/027;(IPC1-7):B08B3/02 主分类号 G03F7/30
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