发明名称 |
METHOD OF MANUFACTURING INDUCTOR WITH SHIELD LAYER FOR IMPROVING EFFICIENCY OF INDUCTOR |
摘要 |
PURPOSE: A method of manufacturing an inductor is provided to improve the efficiency of the inductor by forming a shield layer used as an active layer between the inductor and a silicon substrate. CONSTITUTION: A pad nitride pattern and a pad oxide pattern are sequentially formed on a substrate(100). A plurality of round trenches are formed in the substrate by performing wet-etching using the pad nitride pattern as an etching mask. Oxide is filled in the trenches. A salicide barrier pattern for exposing the filled oxide to the outside is formed thereon. An active shield layer(116) is completed by forming salicide on the filled oxide.
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申请公布号 |
KR20050011091(A) |
申请公布日期 |
2005.01.29 |
申请号 |
KR20030049933 |
申请日期 |
2003.07.21 |
申请人 |
MAGNACHIP SEMICONDUCTOR, LTD. |
发明人 |
YANG, JUN SEOK |
分类号 |
H01L27/04;(IPC1-7):H01L27/04 |
主分类号 |
H01L27/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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