| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition and a method for forming a resist pattern by which the proximity effect can be decreased without decreasing the focal depth, and more preferably, the proximity effect can be decreased while the focal depth is increased. <P>SOLUTION: The resist composition contains a resin component (A) the alkali solubility of which increases by the effect of an acid, an acid generating agent component (B) which generates an acid by exposure, and an organic solvent (C). The component (A) contains: a structural unit (a1) containing an acid dissociable solubility suppressing group and derived from a (meth)acrylate; a structural unit (a2) containing an acid dissociable solubility suppressing group which is less dissociable than the acid dissociable solubility suppressing group included in the structural unit (a1), and derived from a (meth)acrylate; and a structural unit (a3) containing a lactone functional group and derived from a (meth)acrylate. The method for forming a resist pattern is carried out by using the above composition. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
