发明名称 |
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD, AND MEASUREMENT SYSTEM |
摘要 |
<p>The invention pertains to a lithographic apparatus including a radiation system configured to condition a beam of radiation; a projection system configured to project the beam of radiation onto a target portion of a substrate; a displacement device configured to move the moveable object relative to the projection system in substantially a first direction and a second direction differing from the first direction; and a measuring device configured to measure a displacement of the moveable object in a third direction, which is substantially perpendicular to the first direction and to the second direction, wherein the measuring device may include an encoder system.</p> |
申请公布号 |
KR20050039649(A) |
申请公布日期 |
2005.04.29 |
申请号 |
KR20040084831 |
申请日期 |
2004.10.22 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
BEEMS, MARCEL HENDRIKUS MARIA;VANDERPASCH, ENGELBERTUS ANTONIUS FRANSISCUS |
分类号 |
G01B11/00;G03F7/20;H01L21/027;(IPC1-7):H01L21/027 |
主分类号 |
G01B11/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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