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发明名称
PHOTOSENSITIVE POLYMER AND CHEMICALLY AMPLIFIED PHOTORESIST COMPOSITION INCLUDING THE SAME
摘要
申请公布号
KR20050078320(A)
申请公布日期
2005.08.05
申请号
KR20040005713
申请日期
2004.01.29
申请人
DONGJIN SEMICHEM CO., LTD.
发明人
OH, SEUNG KEUN;SON, EUN KYUNG;LEE, JAE WOO;KIM, JAE HYUN
分类号
C07C69/608;(IPC1-7):C07C69/608
主分类号
C07C69/608
代理机构
代理人
主权项
地址
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