发明名称 Critical dimension measuring instrument
摘要 A critical dimension measuring instrument includes a light source, a beam-shaping optical system, a condenser having a condenser pupil, a first microlens array arrangement, a first auxiliary optical element having positive refractive power, a second auxiliary optical element having positive refractive power, and a second microlens array arrangement. The first microlens array arrangement, the first auxiliary optical element, the second auxiliary optical element and the second microlens array arrangement are arranged in successive fashion between the beam-shaping optical system and the condenser.
申请公布号 US6943901(B2) 申请公布日期 2005.09.13
申请号 US20030672048 申请日期 2003.09.26
申请人 LEICA MICROSYSTEMS SEMICONDUCTOR GMBH 发明人 CEMIC FRANZ;DANNER LAMBERT
分类号 G01B11/02;G01B11/00;G01B11/24;G02B3/00;G02B19/00;(IPC1-7):G01B11/14 主分类号 G01B11/02
代理机构 代理人
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