发明名称 TARGET MATERIAL SUPPLY METHOD FOR X-RAY GENERATION, AND ITS DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To suppress evaporation of a target material for generation of a laser plasma X-ray, maintain a diameter of the target material needed up to a sufficiently separate laser condensing point, and enable continuous supply of the material at a high speed and with stability. <P>SOLUTION: After a liquid jet flow 6 of the target material is formed by a nozzle part 5 by pressurizing, cooling and liquefying the target material, this is forcibly cooled under atmosphere of a cryogenic gas 10 at a solidifying cooling part 8, and cooled down to a temperature at which this is solidified in a short time. Owing to this, unnecessary evaporation of the target material is suppressed to a small amount, and without being influenced by fluid instability, the target material can be supplied continuously with stability to the laser condensing point 18 in an X-ray generating vacuum chamber 14 as a filamentous solid target current 12 having a necessary diameter. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005251601(A) 申请公布日期 2005.09.15
申请号 JP20040061667 申请日期 2004.03.05
申请人 MOCHIZUKI TAKAYASU 发明人 MOCHIZUKI TAKAYASU
分类号 H05H1/24;G03F7/20;H01L21/027;H05G2/00 主分类号 H05H1/24
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