| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a polishing pad structure capable of storing a polishing pad in a longitudinally installed state. <P>SOLUTION: This two-sheet integrated polishing pad 1 is integrated with two polishing pads by arranging a first polishing pad 11, a first cushion layer 12, a first adhesive layer 13, a separable base material 14, a second adhesive layer 15, a second cushion layer 16 and a second polishing pad 17 in order. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
