| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition superior in immersion resistance and resolution by making a stable coating to water during immersion exposure. <P>SOLUTION: An acid generating agent constituting the radiation-sensitive resin composition for immersion exposure is an acid generating agent, including fluorine atoms, in particular, a cation part of an onium salt includes at least one fluorine atom, and the onium salt is a sulfonium salt. An anion part of the onium salt is expressed by Formula (1) or (2). In the Formulae (1) and (2), R<SB>f</SB>denotes the fluorine atoms or a perfluoroalkyl group, R denotes a univalent organic group which does not include fluorine atoms, n denotes an integer of 1-5, and m denotes an integer of 1-3. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
