摘要 |
A semiconductor device and its manufacturing method. The semiconductor device has a semi-insulating GaAs substrate 310, a GaAs buffer layer 321 that is formed on the semi-insulating GaAs substrate 310, AlGaAs buffer layer 322, a channel layer 323, a spacer layer 324, a carrier supply layer 325, a spacer layer 326, a Schottky layer 327 composed of an undoped In<SUB>0.48</SUB>Ga<SUB>0.52</SUB>P material, and an n<SUP>+</SUP>-type GaAs cap layer 328. A gate electrode 330 is formed on the Schottky layer 327, and is composed of LaB<SUB>6 </SUB>and has a Schottky contact with the Schottky layer 327, and ohmic electrodes 340 are formed on the n<SUP>+</SUP>-type GaAs cap layer 328.
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