发明名称 METHOD OF MANUFACTURING COLOR FILTER SUBSTRATE, METHOD OF MANUFACTURING ELECTRO-OPTICAL DEVICE, THE ELECTRO-OPTICAL DEVICE AND ELECTRONIC APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide a method of manufacturing an electro-optical device, capable of forming a pixel pattern, that has uniform film thickness. <P>SOLUTION: The method of manufacturing the electro-optical device, having a functional region 2a in which an electro-optical element functions at every pixel and a non-functional region 2b which is formed around the functional region 2a, comprises a discharge process of discharging liquid material, obtained by dissolving or dispersing functional material constituting the electro-optical element into a solvent onto a substrate by a liquid droplet discharge method. In the discharge process, the amount of solvent discharged to the non-functional region 2b per unit area is larger than the amount of the solvent discharged to the functional region 2a per unit area. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006003870(A) 申请公布日期 2006.01.05
申请号 JP20050095183 申请日期 2005.03.29
申请人 SEIKO EPSON CORP 发明人 KIMURA HIDEYUKI;SEKI SHUNICHI;YAMAMOTO NAOKI
分类号 G02B5/20;B05D5/12;B41J2/01;G09F9/00;H01L21/00;H01L21/77;H01L21/84;H01L27/00;H01L27/32;H01L51/00;H01L51/40;H01L51/52;H01L51/56 主分类号 G02B5/20
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