FILM-FORMING COMPOSITION AND METHOD FOR FABRICATING FILM BY USING THE SAME

摘要

The present invention relates to a film-forming composition to improve viscosity and volatility while maintaining unique features of metal precursors and, more specifically, relates to a film-forming composition which may comprise a 3-intracyclic cyclopentadienyl precursor and dimethyethylamine to be useful for forming a film by atomic layer deposition (ALD).