发明名称 Sub-micron laser patterning of graphene and 2D materials
摘要 An appropriately configured pulsed laser is focused onto a graphene sheet and is used to form a desired pattern in the graphene. When the laser pulse strikes the graphene, it modifies the bonding state of the carbon atoms in the graphene lattice, acting as a “blade” and causing a separation in the graphene sheet at the site of the laser pulse without causing damage to the surrounding graphene. The width of the separation, or “cut” in the graphene sheet can be controlled by controlling characteristics of the laser pulse such as beam shape, beam intensity, pulse width, repetition rate, and wavelength to produce a graphene material having desired electrical, optical, thermal, and/or mechanical properties.
申请公布号 US9629251(B2) 申请公布日期 2017.04.18
申请号 US201414565734 申请日期 2014.12.10
申请人 The United States of America, as represented by the Secretary of the Navy 发明人 Currie Marc;Gaskill David Kurt;Nath Anindya
分类号 C30B29/04;H05K3/02;B23K26/364;B23K26/402;B23K103/00 主分类号 C30B29/04
代理机构 US Naval Research Laboratory 代理人 US Naval Research Laboratory ;Barritt Joslyn
主权项 1. A method for forming a laser-patterned two-dimensional material, comprising: focusing a pulsed laser beam on a two-dimensional material along a desired path; wherein at least one of a wavelength, a beam shape, an optical fluence, a pulse width, and a pulse repetition rate of the pulsed laser beam is configured to cause the pulsed laser beam to ablate atoms from the two-dimensional material to form a channel in the two-dimensional material along the desired path without damaging the remainder of the two-dimensional material not illuminated by the pulsed laser beam; and wherein the two-dimensional material is grown by chemical vapor deposition (CVD), a first layer of the two-dimensional material being patterned on a bottom surface thereof before the growth of a second layer of the two-dimensional material on a top surface of the first layer.
地址 Washington DC US