| 发明名称 |
DISPLAY SUBSTRATE, ITS MANUFACTURING METHOD, AND DISPLAY DEVICE |
| 摘要 |
The present invention relates to the field of display technology, and provides a display substrate, its manufacturing method, and a display device. The method comprises a step of forming a pattern of a barrier layer and a pattern of a first electrode. The step of forming the pattern of the barrier layer and the pattern of the first electrode comprises: forming a barrier layer film and a first electrode film sequentially; and forming the pattern of the barrier layer and the pattern of the first electrode by a single patterning process. |
| 申请公布号 |
US2016313622(A1) |
申请公布日期 |
2016.10.27 |
| 申请号 |
US201314381823 |
申请日期 |
2013.12.19 |
| 申请人 |
HEFEI BOE OPTOELECTRONICS TECHNOLOGY CO., LTD. ;BOE TECHNOLOGY GROUP CO., LTD. |
发明人 |
DUAN Xianxue;BAI Mingji;XU Dezhi;ZOU Zhixiang |
| 分类号 |
G02F1/1362;H01L29/786;G02F1/1368;H01L27/12;G02F1/1343 |
主分类号 |
G02F1/1362 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method for manufacturing a display substrate, comprising:
a first step of forming a pattern of a gate insulating layer and a pattern of an active layer on a substrate; a second step of forming a barrier layer film and a first electrode film sequentially on the substrate obtained after the first step; and a third step of forming a pattern of the barrier layer and a pattern of the first electrode by a single patterning process. |
| 地址 |
Hefei, Anhui CN |
