发明名称 SEMICONDUCTOR DEVICE
摘要 A semiconductor device, including a semiconductor substrate, an active region formed on the semiconductor substrate, and a gate runner disposed to surround the active region. The active region includes a first cell group in which a gate electrode of each cell is directly connected to the gate runner, and a second cell group in which a gate electrode of each cell is connected to the gate runner via a di/dt mitigating element. The di/dt mitigating element is a capacitor, a resistor connected in parallel to a capacitor, or an inverse-parallel-connected diode.
申请公布号 US2016308038(A1) 申请公布日期 2016.10.20
申请号 US201615197945 申请日期 2016.06.30
申请人 FUJI ELECTRIC CO., LTD. 发明人 SATO Shigeki
分类号 H01L29/739;H01L29/868;H01L29/49;H01L27/06;H01L29/423 主分类号 H01L29/739
代理机构 代理人
主权项 1. A semiconductor device, comprising: a semiconductor substrate; an active region formed on the semiconductor substrate; and a gate runner disposed to surround the active region, wherein the active region includes a first cell group in which a gate electrode of each cell is directly connected to the gate runner, anda second cell group in which a gate electrode of each cell is connected to the gate runner via a di/dt mitigating element, the di/dt mitigating element including a capacitor that has a trench disposed in the semiconductor substrate,an insulating film covering an inner wall of the trench,first and second electrodes disposed in the trench, the insulating film separating the first and second electrodes from the trench, anda dielectric material disposed between the first and second electrodes.
地址 Kawasaki-shi JP