发明名称 MEMORY CELL COMPRISING NON-SELF-ALIGNED HORIZONTAL AND VERTICAL CONTROL GATES
摘要 The present disclosure relates to a memory cell comprising a vertical selection gate extending in a trench made in a substrate, a floating gate extending above the substrate, and a horizontal control gate extending above the floating gate, wherein the floating gate also extends above a portion of the vertical selection gate over a non-zero overlap distance. Application mainly to the production of a split gate memory cell programmable by hot-electron injection.
申请公布号 US2016308011(A1) 申请公布日期 2016.10.20
申请号 US201615195784 申请日期 2016.06.28
申请人 STMicroelectronics (Rousset) SAS 发明人 LA ROSA Francesco;NIEL Stephan;DELALLEAU Julien;REGNIER Arnaud
分类号 H01L29/423;H01L27/115;H01L29/66;H01L21/28;H01L21/306;H01L29/788;G11C16/14 主分类号 H01L29/423
代理机构 代理人
主权项 1. A memory cell, comprising: a vertical selection gate in a trench in a substrate; a floating gate on the substrate, the floating gate having a protuberance which extends below a first surface of the substrate; and a horizontal control gate on the floating gate.
地址 Rousset FR