发明名称 NOVEL CYCLODISILAZANE DERIVATIVE, METHOD FOR PREPARING THE SAME AND SILICON-CONTAINING THIN FILM USING THE SAME
摘要 Provided are a novel cyclodisilazane derivative, a method for preparing the same, and a silicon-containing thin film using the same, wherein the cyclodisilazane derivative having thermal stability, high volatility, and high reactivity and being present in a liquid state at room temperature and under a pressure where handling is easy, may form a high purity silicon-containing thin film having excellent physical and electrical properties by various deposition methods.
申请公布号 US2016326193(A1) 申请公布日期 2016.11.10
申请号 US201515110707 申请日期 2015.01.08
申请人 DNF CO.,LTD. 发明人 Jang Se Jin;Yang Byeong-il;Kim Sung Gi;Kim Jong Hyun;Kim Do Yeon;Lee Sang-Do;Seok Jang Hyeon;Lee Sang Ick;Kim Myong Woon
分类号 C07F7/21;H01L21/02 主分类号 C07F7/21
代理机构 代理人
主权项 1. A cyclodisilazane derivative represented by the following Chemical Formula 1: in Chemical Formula 1, R1 to R3 are each independently hydrogen, halogen, (C1-C5)alkyl or (C2-C5)alkenyl, and R4 is hydrogen, (C1-C3)alkyl or (C2-C5)alkenyl.
地址 Daejeon KR