发明名称 |
NOVEL CYCLODISILAZANE DERIVATIVE, METHOD FOR PREPARING THE SAME AND SILICON-CONTAINING THIN FILM USING THE SAME |
摘要 |
Provided are a novel cyclodisilazane derivative, a method for preparing the same, and a silicon-containing thin film using the same, wherein the cyclodisilazane derivative having thermal stability, high volatility, and high reactivity and being present in a liquid state at room temperature and under a pressure where handling is easy, may form a high purity silicon-containing thin film having excellent physical and electrical properties by various deposition methods. |
申请公布号 |
US2016326193(A1) |
申请公布日期 |
2016.11.10 |
申请号 |
US201515110707 |
申请日期 |
2015.01.08 |
申请人 |
DNF CO.,LTD. |
发明人 |
Jang Se Jin;Yang Byeong-il;Kim Sung Gi;Kim Jong Hyun;Kim Do Yeon;Lee Sang-Do;Seok Jang Hyeon;Lee Sang Ick;Kim Myong Woon |
分类号 |
C07F7/21;H01L21/02 |
主分类号 |
C07F7/21 |
代理机构 |
|
代理人 |
|
主权项 |
1. A cyclodisilazane derivative represented by the following Chemical Formula 1: in Chemical Formula 1, R1 to R3 are each independently hydrogen, halogen, (C1-C5)alkyl or (C2-C5)alkenyl, and R4 is hydrogen, (C1-C3)alkyl or (C2-C5)alkenyl. |
地址 |
Daejeon KR |