| 摘要 |
<p>Process for producing a sieve type matrix for the electrolytic deposition of sieve like metal foils uses a body into which have been impressed the required pattern of holes or perforations. The depressions so formed are then filled with a material which is flexible and elastic at room temps. or higher, but which is firm and rigid when cooled to 0 degree C. or below. It can then be ground and polished at the reduced temp. The material may be a natural or synthetic rubber-like material. It should pref. be cooled to between -20 and -30 degrees C. Suitable for forming "rotex-sten ils" for printing, shaving screens, technical sieves, pressure switches and heating foils. Overcomes the problem associated with this process of removing the elastic material at normal temp. When removed at low temps. it becomes much more rigid and brittle and easy to grind off. At normal temps. it regains its elasticity.</p> |
