| 主权项 |
1. A process for producing a photo-mask on a photopolymeric surface, comprising:
providing a photopolymeric surface having been coated with a film, wherein said film is comprised of
at least one active component,at least one agent selected from the group consisting of a multi-valent salt, an acid, an acidic buffer solution, and a poly-cationic polymer,at least one wetting agent,at least one polymeric anti-crystallization agent,at least one plasticizer,optionally at least one additive selected from the group consisting of a penetrating agent, a humectant, and a polymer,and at least one second material which is the same or different from the at least one active component; and directly printing on said film at least one ink, wherein
said at least one ink is comprised of at least one anionic polymer, the at least one anionic polymer undergoing a first interaction with at least one of the at least one active component, the at least one agent, or the at least one second material, and whereinthe first interaction is a chemical reaction, a physical reaction, or a combination thereof that affects immobilization of a plurality of ink droplets as a corresponding plurality of immobilized ink dots on the film, said immobilization forming a UV-absorbing pattern on top of said film. |
