发明名称 Electron-optical appts. aperture plate - with thin region surrounding aperture and thicker integral reinforcement regions
摘要 <p>An appts. for limiting the electron beam of an electron-optical device, comprises a completely open region or regions and, in addition, a uniform and consistent material, in two completely different thicknesses the thinner region of which is adjacent to the aperture and constitutes its surround while the thicker region constitutes a stiffening rib or frame. Pref. the continuous, cohesive material is a heavy metal, more specifically. Used partic. as the object aperture plate of an electron microscope. As the condenser aperture plate of an electromicroscope.</p>
申请公布号 FR2336793(A1) 申请公布日期 1977.07.22
申请号 FR19750039504 申请日期 1975.12.23
申请人 HEIDENHAIN GMBH JOHANNES 发明人
分类号 H01J37/09;(IPC1-7):01J37/02;01J37/26 主分类号 H01J37/09
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