发明名称
摘要 This invention relates to an electroplating device for partially plating a series of items moving along a path at a constant level, the device including at least one electroplating bath positioned along the path having end walls with slots therein through which the items to be plated may pass, and an end wall configuration adjacent the slot which combines with a circulation pump to maintain a constant liquid level in the bath above the bottom of the slot.
申请公布号 FR2295134(B1) 申请公布日期 1978.05.19
申请号 FR19750038638 申请日期 1975.12.17
申请人 SIEMENS AG 发明人
分类号 C25D5/02;C25D17/00 主分类号 C25D5/02
代理机构 代理人
主权项
地址