发明名称 APPARATUS FOR EXPOSING ALL PERIPHRAL BAND PORTION OF LONG CYLINDRICAL PRODUCT
摘要 The invention provides an apparatus capable of effecting relative movement between the oval-like girth or circumference of a workpiece and tool means while maintaining the planar and radial workpiece surfaces in a fixed plane relative to the tool means as they are exposed thereto. The apparatus is especially useful in laser welding, and for this use, includes a base in a fixed plane relative to a focusing lens, means for effecting relative translational movement between the base and lens, and bearing and shaft means, including chuck means, for holding the workpiece in proper relation to the lens and for rotating the workpiece about longitudinal axes through the radii of the oval-like workpiece girth. The relative translational movement between the base and lens is utilized to cause the laser beam to transverse the planar surfaces of the workpiece whereas the rotational motion is utilized to cause the beam to traverse the radial surfaces of the workpiece while maintaining these latter surfaces in the plane established by the planar surfaces during their exposure to the tool means.
申请公布号 JPS5495944(A) 申请公布日期 1979.07.28
申请号 JP19780159812 申请日期 1978.12.20
申请人 发明人
分类号 B23K26/00;B23K26/08;B23K26/20 主分类号 B23K26/00
代理机构 代理人
主权项
地址