发明名称 |
POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, TFT SUBSTRATE, INTERLAYER INSULATING FILM, DISPLAY DEVICE, AND METHODS FOR PRODUCING SAME |
摘要 |
The present invention provides a positive photosensitive resin composition which leaves remarkably little residue when developed and with which a cured film that is excellent in terms of high transparency, high chemical resistance, high dielectric constant, and low leakage current can be obtained. The present invention is a positive photosensitive resin composition that is characterized by containing (A) metal oxide particles, (B) at least one type of polymer selected from among a polyimide precursor, a polybenzoxazole precursor, a polyimide, and a polybenzoxazole, and (C) an aromatic compound having a hydroxyl group and/or a thiol group. |
申请公布号 |
WO2016148176(A1) |
申请公布日期 |
2016.09.22 |
申请号 |
WO2016JP58276 |
申请日期 |
2016.03.16 |
申请人 |
TORAY INDUSTRIES, INC. |
发明人 |
KONOSHIMA, Yohei;HIBINO, Toshiyasu;SUWA, Mitsuhito |
分类号 |
G03F7/004;G03F7/023 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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