发明名称 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, TFT SUBSTRATE, INTERLAYER INSULATING FILM, DISPLAY DEVICE, AND METHODS FOR PRODUCING SAME
摘要 The present invention provides a positive photosensitive resin composition which leaves remarkably little residue when developed and with which a cured film that is excellent in terms of high transparency, high chemical resistance, high dielectric constant, and low leakage current can be obtained. The present invention is a positive photosensitive resin composition that is characterized by containing (A) metal oxide particles, (B) at least one type of polymer selected from among a polyimide precursor, a polybenzoxazole precursor, a polyimide, and a polybenzoxazole, and (C) an aromatic compound having a hydroxyl group and/or a thiol group.
申请公布号 WO2016148176(A1) 申请公布日期 2016.09.22
申请号 WO2016JP58276 申请日期 2016.03.16
申请人 TORAY INDUSTRIES, INC. 发明人 KONOSHIMA, Yohei;HIBINO, Toshiyasu;SUWA, Mitsuhito
分类号 G03F7/004;G03F7/023 主分类号 G03F7/004
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