发明名称 SULFONIC ACID DERIVATIVE COMPOUND, PHOTOACID GENERATOR, RESIST COMPOSITION, CATIONIC POLYMERIZATION INITIATOR, AND CATIONICALLY POLYMERIZABLE COMPOSITION
摘要 Provided are: a sulfonic acid derivative compound that has high absorbance with respect to light having a wavelength of 365 nm, that has high solubility in an organic solvent, and that exhibits a good acid generation rate; a photoacid generator; a resist composition; a cationic polymerization initiator; and a cationically polymerizable composition. The sulfonic acid derivative compound is represented by general formula (I) (in formula (I), X represents a linear or branched alkyl group having 1-14 carbon atoms and R represents an aliphatic hydrocarbon group having 1-18 carbon atoms, an aryl group having 6-20 carbon atoms, an aryl alkyl group having 7-20 carbon atoms, an aryl group that has 7-20 carbon atoms and that is substituted by an acyl group, an alicyclic hydrocarbon group having 3-12 carbon atoms, a 10-camphor-yl group, or the like).
申请公布号 WO2016147357(A1) 申请公布日期 2016.09.22
申请号 WO2015JP58120 申请日期 2015.03.18
申请人 ADEKA CORPORATION 发明人 YANAGISAWA Satoshi;KIMURA Masaki;TODA Hitomi;SHIGENO Koichi
分类号 C07D221/14;C08G59/38;G03F7/004 主分类号 C07D221/14
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