发明名称 METHOD OF SELECTIVELY DEPOSITING GLASS ON SEMICONDUCTOR DEVICES
摘要 The method comprises depositing charges of a selected polarity on the areas coated with isulating material of a semiconductor device having areas of "bare" semiconductor and areas coated with insulating material, immersing the charged device in a liquid composition comprising an insulating liquid and dispersed glass particles carrying a charge of particular polarity so that the glass particles may deposite selectively either onthe bare areas of semiconductor or on the areas coated with insulator, and removing the glass-coated device from the liquid compositon, drying and firing the coated device at a temp. enough to fuse th glass.
申请公布号 KR800000439(B1) 申请公布日期 1980.05.26
申请号 KR19750000350 申请日期 1975.02.21
申请人 R C A CO LTD 发明人 COMIZZOLI R
分类号 H01L21/314;(IPC1-7):H01L21/31 主分类号 H01L21/314
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