| 发明名称 |
FLUID HANDLING STRUCTURE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD |
| 摘要 |
A fluid handling structure for a lithographic apparatus is disclosed. The fluid handling structure has a plurality of openings arranged in plan, in a line. The fluid handling structure is configured such that the openings are directed, in use, towards a facing surface, the facing surface being a substrate and/or a substrate table. The substrate table is configured to support the substrate. Outward of the line of openings is a damper. The damper may have a width that varies along the line of openings. The damper width is defined between the line of openings and an opposing damper edge. |
| 申请公布号 |
US2016306283(A1) |
申请公布日期 |
2016.10.20 |
| 申请号 |
US201615196120 |
申请日期 |
2016.06.29 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
DIRECKS Daniel Jozef Maria;DONDERS Sjoerd Nicolaas Lambertus;KEMPER Nicolaas Rudolf;PHILIPS Danny Maria Hubertus;RIEPEN Michel;VAN DEN DUNGEN Clemens Johannes Gerardus;BAETEN Adrianes Johannes;EVANGELISTA Fabrizio |
| 分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A fluid handling structure for a lithographic apparatus, the fluid handling structure having a plurality of openings arranged in plan, in a line, the fluid handling structure configured such that the openings are directed, in use, towards a facing surface, the facing surface being a substrate and/or a substrate table configured to support the substrate, wherein outward of the line of openings is a damper, the damper having a width that varies along the line of openings, the width being defined between the line of openings and an opposing damper edge. |
| 地址 |
Veldhoven NL |
