发明名称 Process for producing cyclohexanone compound
摘要 The invention has an object of providing an economical and highly efficient process for producing a cyclohexanone compound such as cyclohexanone. An aspect of the invention resides in a process for producing a cyclohexanone compound by performing hydrogenation reaction of a phenol compound in a gas phase in the presence of a palladium catalyst supported on a carrier to produce the corresponding cyclohexanone compound, wherein the hydrogenation reaction is carried out in the presence of at least one nitrogen compound selected from ammonia, amine compounds and heteroaromatic compounds.
申请公布号 US9481625(B2) 申请公布日期 2016.11.01
申请号 US201414779918 申请日期 2014.04.01
申请人 MITSUI CHEMICALS, INC. 发明人 Matsuura Akira;Watanabe Takuro
分类号 C07C45/00;B01J23/44;B01J21/04;B01J23/58;B01J35/10;B01J37/02;B01J31/02;C07D223/10 主分类号 C07C45/00
代理机构 Foley & Lardner LLP 代理人 Foley & Lardner LLP
主权项 1. A process for producing a cyclohexanone compound by performing hydrogenation reaction of a phenol compound in a gas phase in the presence of a palladium catalyst supported on a carrier to produce the corresponding cyclohexanone compound, wherein the hydrogenation reaction is carried out in the presence of at least one nitrogen compound selected from ammonia, amine compounds and heteroaromatic compounds, wherein the nitrogen compound is free from a structure formed by the bonding of a hydrogen atom to a nitrogen atom, wherein the palladium catalyst supported on the carrier further includes at least one metal element selected from lithium, sodium, potassium, magnesium, calcium and barium, and wherein the palladium catalyst supported on the carrier is obtained by impregnating the supported palladium catalyst still free from any alkali metal and/or alkaline earth metal compounds with an aqueous solution of hydroxides, nitrate salts, acetate salts or carbonate salts of at least one metal element selected from lithium, sodium, potassium, magnesium, calcium or barium, followed by drying or calcination.
地址 Tokyo JP
您可能感兴趣的专利