Method for making a closed gate MOS transistor with self-aligned contacts with dual passivation layer

摘要

A method of manufacturing a closed gate MOS transistor having a self-aligned drain contact is presented which insures that the drain contact will have the minimum required geometry. The method employs a self-aligned procedure which insures that the drain contact will be the minimum dimensions to insure a high speed device. Also, the completed device includes a dual layer passivation overcoat which insures a hermetically sealed device.