发明名称 |
Semiconductor device and method of forming openings in thermally-conductive frame of FO-WLCSP to dissipate heat and reduce package height |
摘要 |
A semiconductor device has a thermally-conductive frame and interconnect structure formed over the frame. The interconnect structure has an electrical conduction path and thermal conduction path. A first semiconductor die is mounted to the electrical conduction path and thermal conduction path of the interconnect structure. A portion of a back surface of the first die is removed by grinding. An EMI shielding layer can be formed over the first die. The first die can be mounted in a recess of the thermally-conductive frame. An opening is formed in the thermally-conductive frame extending to the electrical conduction path of the interconnect structure. A second semiconductor die is mounted over the thermally-conductive frame opposite the first die. The second die is electrically connected to the interconnect structure using a bump disposed in the opening of the thermally-conductive frame. |
申请公布号 |
US9508626(B2) |
申请公布日期 |
2016.11.29 |
申请号 |
US201012766607 |
申请日期 |
2010.04.23 |
申请人 |
STATS ChipPAC Pte. Ltd. |
发明人 |
Pagaila Reza A.;Lin Yaojian |
分类号 |
H01L23/36;H01L23/367;H01L23/498;H01L23/552;H01L25/065;H01L25/10;H01L21/56;H01L23/31;H01L23/00 |
主分类号 |
H01L23/36 |
代理机构 |
Atkins and Associates, P.C. |
代理人 |
Atkins Robert D.;Atkins and Associates, P.C. |
主权项 |
1. A method of making a semiconductor device, comprising:
providing a thermally-conductive frame; forming an opening through the thermally-conductive frame; depositing a sacrificial material in the opening of the thermally-conductive frame; forming an interconnect structure over the thermally-conductive frame, the interconnect structure including an electrical conduction path and thermal conduction path; mounting a first semiconductor die to the electrical conduction path and thermal conduction path of the interconnect structure; removing the sacrificial material from the opening of the thermally-conductive frame; and mounting a second semiconductor die over a surface of the thermally-conductive frame opposite the first semiconductor die, the second semiconductor die being electrically connected to the interconnect structure using a first bump disposed in the opening of the thermally-conductive frame. |
地址 |
Singapore SG |