发明名称 Semiconductor device and method of forming openings in thermally-conductive frame of FO-WLCSP to dissipate heat and reduce package height
摘要 A semiconductor device has a thermally-conductive frame and interconnect structure formed over the frame. The interconnect structure has an electrical conduction path and thermal conduction path. A first semiconductor die is mounted to the electrical conduction path and thermal conduction path of the interconnect structure. A portion of a back surface of the first die is removed by grinding. An EMI shielding layer can be formed over the first die. The first die can be mounted in a recess of the thermally-conductive frame. An opening is formed in the thermally-conductive frame extending to the electrical conduction path of the interconnect structure. A second semiconductor die is mounted over the thermally-conductive frame opposite the first die. The second die is electrically connected to the interconnect structure using a bump disposed in the opening of the thermally-conductive frame.
申请公布号 US9508626(B2) 申请公布日期 2016.11.29
申请号 US201012766607 申请日期 2010.04.23
申请人 STATS ChipPAC Pte. Ltd. 发明人 Pagaila Reza A.;Lin Yaojian
分类号 H01L23/36;H01L23/367;H01L23/498;H01L23/552;H01L25/065;H01L25/10;H01L21/56;H01L23/31;H01L23/00 主分类号 H01L23/36
代理机构 Atkins and Associates, P.C. 代理人 Atkins Robert D.;Atkins and Associates, P.C.
主权项 1. A method of making a semiconductor device, comprising: providing a thermally-conductive frame; forming an opening through the thermally-conductive frame; depositing a sacrificial material in the opening of the thermally-conductive frame; forming an interconnect structure over the thermally-conductive frame, the interconnect structure including an electrical conduction path and thermal conduction path; mounting a first semiconductor die to the electrical conduction path and thermal conduction path of the interconnect structure; removing the sacrificial material from the opening of the thermally-conductive frame; and mounting a second semiconductor die over a surface of the thermally-conductive frame opposite the first semiconductor die, the second semiconductor die being electrically connected to the interconnect structure using a first bump disposed in the opening of the thermally-conductive frame.
地址 Singapore SG